China Suppliers > Tianjin Yuansu Chemical Reagent Co., LTD > 2,3,4,4'-Tetrahydroxybenzophenone 1,2-naphthoquinonediazido-5-sulfonate
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2,3,4,4'-Tetrahydroxybenzophenone 1,2-naphthoquinonediazido-5-sulfonate 107761-81-9
Category : Paint and Coatings/Appliance Paint
CAS NO : 107761-81-9 EC NO : MF : C13H10O5·x(C10H6N2O4S) MW : 479.44 Specification : 99% min Packing : 25kg 50kg drum or bag Product description : What is the chemical of 2,3,4,4'-Tetrahydroxybenzophenone 1,2-naphthoquinonediazido-5-sulfonate? Appearance:white to light yellow solid Assay: 99%min by HPLC IR Identity: conform to standard HNMR： conform to standard carbon spectrum: conform to standard Water by K. F.:0.5% max or as per the customer’s request Loss on drying:0.5% max. or as per the customer’s request ==================================================== Usage: As a photoactive acid generator (PAG) for positive photoresist, it decomposes under UV exposure (g-line 436 nm/i-line 365 nm), releasing sulfonic acid to catalyze the formation of soluble regions in phenolic resin solvents, achieving micro nano pattern transfer; Non pharmaceutical/food use, belonging to industrial grade photolithography chemicals. ============================================================================== Synthesis route: The complete process is not described in public information, but the structure indicates that it is the esterification and condensation product of 2,3,4,4 '- tetrahydroxybenzophenone and 1,2-diazide naphthoquinone-5-sulfonyl chloride (or 5-sulfonic acid). Typical routes may include: ① first preparing polyhydroxybenzophenone (such as derived from the rearrangement of p-hydroxybenzoate ester with catechol Fries or Ullmann coupling); ② Under alkaline conditions (such as K ₂ CO ∝/acetone), react with 1,2-diazide naphthoquinone-5-sulfonyl chloride to form the target ester. This reaction requires strict temperature control (<30 ° C), avoidance of light, and an inert atmosphere, as both azide and phenolic hydroxyl groups have photosensitivity/reactivity; The specific process is mostly kept confidential by the enterprise, and there are no detailed steps in public literature. Uses : Mainly used for photoresist manufacturing in the semiconductor and FPD industries, as well as the production of functional fine chemicals such as optoelectronic devices and fiber optic communication devices Synonyms : ESTER OF 2-DIAZO-1-NAPHTHOL-4-SULFONE WITH 2,3,4-TRIHYDROXY-BENZOPHENONE;ESTER OF 2-DIAZO-1-NAPHTHOL-5-SULFONE WITH 2,3,4,4'-TETRAHYDROXY-BENZOPHENONE;2-diazo-1-naphthol-5-sulfonic acid, ester with 2,3,4,4'-tetrahydroxy benzophenone;1-Naphthalenesulfonic acid, 6-Diazo-5,6-dihydro-5-oxo-, ester with (4-hydroxyphenyl) (2,3,4-trihydroxyphenyl)methanone;2,3,4,4'-Tetrahydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonic acid ester;tetrahydroxybenzophenone naphthoquinonediazide-5-sulfonate Molecular Structure : 
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2,3,4,4'-Tetrahydroxybenzophenone 1,2-naphthoquinonediazido-5-sulfonate